Invention Grant
- Patent Title: Selective deposition of tungsten
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Application No.: US15615489Application Date: 2017-06-06
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Publication No.: US10714385B2Publication Date: 2020-07-14
- Inventor: Alexey Y. Kovalgin , Mengdi Yang , Antonius A. I. Aarnink , Rob A. M. Wolters
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Agency: Snell & Wilmer L.L.P.
- Main IPC: H01L21/31
- IPC: H01L21/31 ; H01L21/768 ; C23C16/04 ; C23C16/14 ; C23C16/56 ; C23C16/455 ; C23C16/06 ; H01L21/285 ; H01L23/532

Abstract:
A method for selectively depositing a metal film onto a substrate is disclosed. In particular, the method comprising flowing a metal precursor onto the substrate and flowing a non-metal precursor onto the substrate, while contacting the non-metal precursor with a hot wire. Specifically, a reaction between a tungsten precursor and a hydrogen precursor selectively forms a tungsten film, where the hydrogen precursor is excited by a tungsten hot wire.
Public/Granted literature
- US20180025939A1 SELECTIVE DEPOSITION OF TUNGSTEN Public/Granted day:2018-01-25
Information query
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