Invention Grant
- Patent Title: Magnetic tunnel junctions
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Application No.: US16434634Application Date: 2019-06-07
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Publication No.: US10720569B2Publication Date: 2020-07-21
- Inventor: Wei Chen , Witold Kula , Manzar Siddik , Suresh Ramarajan , Johnathan D. Harms
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John P.S.
- Main IPC: H01L43/02
- IPC: H01L43/02 ; H01L43/10 ; H01L43/08 ; G11C11/16 ; H01L27/22

Abstract:
A magnetic tunnel junction comprises a conductive first magnetic electrode comprising magnetic recording material, a conductive second magnetic electrode spaced from the first electrode and comprising magnetic reference material, and a non-magnetic tunnel insulator material between the first and second electrodes. The magnetic reference material of the second electrode comprises a synthetic antiferromagnetic construction comprising two spaced magnetic regions one of which is closer to the tunnel insulator material than is the other. The one magnetic region comprises a polarizer region comprising CoxFeyBz where “x” is from 0 to 90, “y” is from 10 to 90, and “z” is from 10 to 50. The CoxFeyBz is directly against the tunnel insulator. A non-magnetic region comprising an Os-containing material is between the two spaced magnetic regions. The other magnetic region comprises a magnetic Co-containing material. Other embodiments are disclosed.
Public/Granted literature
- US20190305211A1 Magnetic Tunnel Junctions Public/Granted day:2019-10-03
Information query
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