Invention Grant
- Patent Title: Bias correction for lithography
-
Application No.: US16572876Application Date: 2019-09-17
-
Publication No.: US10725383B2Publication Date: 2020-07-28
- Inventor: Harold Robert Zable
- Applicant: D2S, Inc.
- Applicant Address: US CA San Jose
- Assignee: D25, Inc.
- Current Assignee: D25, Inc.
- Current Assignee Address: US CA San Jose
- Agency: MLO, a professional corp.
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F1/78 ; H01J37/317 ; H01J37/302 ; G06F19/00

Abstract:
Methods include inputting an array of pixels, where each pixel in the array of pixels has a pixel dose. The array of pixels represents dosage on a surface to be exposed with a plurality of patterns, each pattern of the plurality of patterns having an edge. A target bias is input. An edge of a pattern in the plurality of patterns is identified. For each pixel which is in a neighborhood of the identified edge, a calculated pixel dose is calculated such that the identified edge is relocated by the target bias. The array of pixels with the calculated pixel doses is output. Systems for performing the methods are also disclosed.
Public/Granted literature
- US20200012195A1 BIAS CORRECTION FOR LITHOGRAPHY Public/Granted day:2020-01-09
Information query
IPC分类: