Invention Grant
- Patent Title: Method for depositing a metal chalcogenide on a substrate by cyclical deposition
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Application No.: US16417938Application Date: 2019-05-21
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Publication No.: US10734223B2Publication Date: 2020-08-04
- Inventor: Miika Mattinen , Mikko Ritala , Markku Leskelä
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Agency: Snell & Wilmer L.L.P.
- Main IPC: H01L21/02
- IPC: H01L21/02 ; C23C16/455 ; C23C16/56 ; H01L29/786 ; H01L29/24 ; C23C16/30 ; H01L29/74 ; H01L29/778 ; H01L29/66 ; C23C16/52
Abstract:
A method for depositing a metal chalcogenide on a substrate by cyclical deposition is disclosed. The method may include, contacting the substrate with at least one metal containing vapor phase reactant and contacting the substrate with at least one chalcogen containing vapor phase reactant. Semiconductor device structures including a metal chalcogenide deposited by the methods of the disclosure are also provided.
Public/Granted literature
- US20190272993A1 METHOD FOR DEPOSITING A METAL CHALCOGENIDE ON A SUBSTRATE BY CYCLICAL DEPOSITION Public/Granted day:2019-09-05
Information query
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