Invention Grant
- Patent Title: Aluminum indium phosphide subfin germanium channel transistors
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Application No.: US15752209Application Date: 2015-09-11
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Publication No.: US10734488B2Publication Date: 2020-08-04
- Inventor: Matthew V. Metz , Willy Rachmady , Harold W. Kennel , Van H. Le , Benjamin Chu-Kung , Jack T. Kavalieros , Gilbert Dewey
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Green, Howard & Mughal LLP
- International Application: PCT/US2015/049634 WO 20150911
- International Announcement: WO2017/044117 WO 20170316
- Main IPC: H01L29/267
- IPC: H01L29/267 ; H01L27/092 ; H01L29/10 ; H01L27/11 ; H01L29/78 ; H01L21/8238 ; H01L29/66

Abstract:
Embodiments related to transistors and integrated circuits having aluminum indium phosphide subfins and germanium channels, systems incorporating such transistors, and methods for forming them are discussed.
Public/Granted literature
- US20200212186A1 ALUMINUM INDIUM PHOSPHIDE SUBFIN GERMANIUM CHANNEL TRANSISTORS Public/Granted day:2020-07-02
Information query
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