Invention Grant
- Patent Title: Resin composition and semiconductor device
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Application No.: US16086982Application Date: 2017-03-30
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Publication No.: US10738187B2Publication Date: 2020-08-11
- Inventor: Hiroki Myodo , Toyokazu Hotchi
- Applicant: NAMICS CORPORATION
- Applicant Address: JP Niigata
- Assignee: NAMICS CORPORATION
- Current Assignee: NAMICS CORPORATION
- Current Assignee Address: JP Niigata
- Agency: Rankin, Hill & Clark LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@411a7e12
- International Application: PCT/JP2017/013275 WO 20170330
- International Announcement: WO2017/170873 WO 20171005
- Main IPC: C08L33/08
- IPC: C08L33/08 ; C08F2/44 ; C08K3/36 ; C08K5/09 ; C08L33/04 ; H01L23/29 ; H01L23/31 ; C08F222/18 ; C08F236/06

Abstract:
An object of the present invention is to provide a resin composition in which voids are suppressed during application, the voids and delamination are suppressed after reflow subsequent to mounting and a moisture absorption resistance test, and the delamination and change in resistance value after curing are suppressed, when used in a pre-supply type process. Provided is the resin composition containing (A) an acrylate compound or methacrylate compound having a specific structure and not having an aliphatic cyclic structure, (B) an acrylate compound or a methacrylate compound having an aliphatic cyclic structure and not having a structure of Chemical Formula (1), (C) an acid anhydride-modified polybutadiene compound, (D) silica particles, and (E) a polymerization initiator.
Public/Granted literature
- US20190100646A1 RESIN COMPOSITION AND SEMICONDUCTOR DEVICE Public/Granted day:2019-04-04
Information query
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