Invention Grant
- Patent Title: Reflection-mode electron-beam inspection using ptychographic imaging
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Application No.: US16412505Application Date: 2019-05-15
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Publication No.: US10755892B2Publication Date: 2020-08-25
- Inventor: Weijie Huang
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: H01J37/29
- IPC: H01J37/29 ; G06T11/00 ; H01J37/26 ; H01J37/147 ; G06T3/40

Abstract:
A particle-beam inspection system may include a reflective particle-beam imaging system providing an image of a selected portion of a sample and a diffraction pattern of the selected portion of the sample and a controller communicatively coupled to the reflective particle-beam imaging system. The controller may receive two or more sample-plane images from the reflective particle-beam imaging system associated with two or more selected portions of the sample, where at least some of the two or more selected portions of the sample overlap. The controller may further receive two or more diffraction-plane images from the reflective particle-beam imaging system associated with the two or more selected portions of the sample. The controller may further construct one or more output images of the two or more selected portions of the sample from the two or more diffraction-plane images using phase information obtained from the two or more sample-plane images.
Public/Granted literature
- US20190362935A1 Reflection-Mode Electron-Beam Inspection Using Ptychographic Imaging Public/Granted day:2019-11-28
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