- Patent Title: Method of detecting a defect and apparatus for performing the same
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Application No.: US16039647Application Date: 2018-07-19
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Publication No.: US10782254B2Publication Date: 2020-09-22
- Inventor: Hyon-Seok Song , In-Yong Kang , Jong-Ju Park
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-Si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-Si, Gyeonggi-do
- Agency: Lee IP Law, PC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@44127322
- Main IPC: G01N23/2251
- IPC: G01N23/2251 ; G06T7/00 ; H01J37/28 ; G03F1/86 ; H01L21/67 ; H01L21/66

Abstract:
In a method of detecting a defect, a region of a substrate may be primarily scanned using a first electron beam to detect a first defect. A remaining region of the substrate, which may be defined by excluding a portion in which the first defect may be positioned from the region of the substrate, may be secondarily scanned using a second electron beam to detect a second defect. Thus, the portion with the defect may not be scanned in a following scan process so that a scanning time may be remarkably decreased.
Public/Granted literature
- US20190162681A1 METHOD OF DETECTING A DEFECT AND APPARATUS FOR PERFORMING THE SAME Public/Granted day:2019-05-30
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