Invention Grant
- Patent Title: Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species
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Application No.: US14457058Application Date: 2014-08-11
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Publication No.: US10804098B2Publication Date: 2020-10-13
- Inventor: Petri Raisanen , Jung Sung-hoon , Verghese Mohith
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Agency: Snell & Wilmer L.L.P.
- Main IPC: H01L21/02
- IPC: H01L21/02 ; C23C16/52 ; C01B13/11 ; C23C16/40 ; C23C16/455 ; H01L29/51
Abstract:
The present invention relates to a process and system for depositing a thin film onto a substrate. One aspect of the invention is depositing a thin film metal oxide layer using atomic layer deposition (ALD).
Public/Granted literature
- US20140346650A1 SYSTEMS AND METHODS FOR THIN-FILM DEPOSITION OF METAL OXIDES USING EXCITED NITROGEN-OXYGEN SPECIES Public/Granted day:2014-11-27
Information query
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