Invention Grant
- Patent Title: Defect inspection method and defect inspection system
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Application No.: US15939311Application Date: 2018-03-29
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Publication No.: US10809635B2Publication Date: 2020-10-20
- Inventor: Chien-Huei Chen , Hung-Yi Chung , Chao-Ting Hong , Cheng-Kuang Lee , Xiaomeng Chen , Teng-Cheng Hsu
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Main IPC: G01N21/88
- IPC: G01N21/88 ; G03F7/20 ; G06T7/00 ; G01N21/95 ; G01N21/956 ; H01J37/28

Abstract:
A defect inspection method and a defect inspection system are provided. In the method, a plurality of candidate defect images are retrieved from inspection images obtained by at least one optical inspection tool performing hot scans on at least one wafer and a plurality of attributes are extracted from the inspection images. A random forest classifier including a plurality of decision trees for classifying the candidate defect images is created, wherein the decision trees are built with different subset of the attributes and the candidate defect images. A plurality of candidate defect images are retrieved from the optical inspection tool in runtime and applied to the decision trees, and classified into nuisance images and real defect images according to votes of the decision trees in which the nuisance images are filtered out. The real defect images with the votes over a confidence value are sampled for microscopic review.
Public/Granted literature
- US20190155164A1 DEFECT INSPECTION METHOD AND DEFECT INSPECTION SYSTEM Public/Granted day:2019-05-23
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