Invention Grant
- Patent Title: Gas distribution device for a wafer processing apparatus
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Application No.: US15998775Application Date: 2018-08-16
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Publication No.: US10829852B2Publication Date: 2020-11-10
- Inventor: Petri Raisanen , Ward Johnson
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Agency: Snell & Wilmer L.L.P.
- Main IPC: C23C16/44
- IPC: C23C16/44 ; H01L21/67 ; C23C16/52 ; C23C16/455

Abstract:
A reaction system is disclosed that may be used to prevent formation of contaminants. The reaction system includes a showerhead that may be configured with a gated nanochannel grid to prevent particular gaseous precursors from passing through depending on whether a voltage is applied. The gated nanochannel grid may allow for both polar and non-polar molecules to pass, or may be configured to allow just non-polar or just polar molecules to pass.
Public/Granted literature
- US20200056282A1 GAS DISTRIBUTION DEVICE FOR A WAFER PROCESSING APPARATUS Public/Granted day:2020-02-20
Information query
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