Invention Grant
- Patent Title: Charged particle beam device
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Application No.: US16320525Application Date: 2016-08-09
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Publication No.: US10832889B2Publication Date: 2020-11-10
- Inventor: Asako Kaneko , Hisayuki Takasu , Toru Iwaya
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECH CORPORATION
- Current Assignee: HITACHI HIGH-TECH CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Mattingly & Malur, PC
- International Application: PCT/JP2016/073414 WO 20160809
- International Announcement: WO2018/029778 WO 20180215
- Main IPC: H01J37/20
- IPC: H01J37/20 ; H01J37/09 ; H01J37/305 ; H01J37/30

Abstract:
A charged particle beam device that can improve machining position precision in section processing using a shielding plate is provided. The invention is directed to a charged particle beam device including: an ion source (101); a sample stand (106) on which a sample (107) is mounted; a shielding plate (108) placed so that a portion of the sample (107) is exposed when seen from the ion source (101); and tilt units (123, 124) that tilt the sample (107) and the shielding plate (108) relative to the irradiation direction of an ion beam (102) from the ion source (101) to the sample (107).
Public/Granted literature
- US20190272973A1 CHARGED PARTICLE BEAM DEVICE Public/Granted day:2019-09-05
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