Invention Grant
- Patent Title: Charged particle beam system and method
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Application No.: US16429315Application Date: 2019-06-03
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Publication No.: US10854421B2Publication Date: 2020-12-01
- Inventor: Daniela Donhauser , Christian Mueller , Barry Chamley , Tobias Volkenandt , Dirk Preikszas , Giuseppe Pavia , Heiko Stegmann
- Applicant: Carl Zeiss Microscopy GmbH , Carl Zeiss Microscopy Ltd.
- Applicant Address: DE Jena GB Cambridge
- Assignee: Carl Zeiss Microscopy GmbH,Carl Zeiss Microscopy Ltd.
- Current Assignee: Carl Zeiss Microscopy GmbH,Carl Zeiss Microscopy Ltd.
- Current Assignee Address: DE Jena GB Cambridge
- Agency: Fish & Richardson P.C.
- Priority: DE102017202339 20170214
- Main IPC: H01J37/304
- IPC: H01J37/304 ; H01J37/08 ; H01J37/317
Abstract:
A charged particle beam system includes a charged particle source, an extraction electrode, a suppressor electrode, a first variable voltage supply for biasing the extraction electrode with an extraction voltage and a second variable voltage supply for biasing the suppressor electrode with a suppressor voltage.
Public/Granted literature
- US20190304743A1 CHARGED PARTICLE BEAM SYSTEM AND METHOD Public/Granted day:2019-10-03
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