Invention Grant
- Patent Title: Contact configuration for optoelectronic device
-
Application No.: US15798909Application Date: 2017-10-31
-
Publication No.: US10854785B2Publication Date: 2020-12-01
- Inventor: Alexander Dobrinsky , Maxim S. Shatalov , Mikhail Gaevski , Michael Shur
- Applicant: Sensor Electronic Technology, Inc.
- Applicant Address: US SC Columbia
- Assignee: Sensor Electronic Technology, Inc.
- Current Assignee: Sensor Electronic Technology, Inc.
- Current Assignee Address: US SC Columbia
- Agency: LaBatt, LLC
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L33/40 ; H01L33/20 ; H01L33/44 ; H01L33/02 ; H01L33/32 ; H01L33/12 ; H01L33/00 ; H01L31/0224 ; H01L31/0304 ; H01L31/18 ; H01L33/38 ; H01L31/0232 ; H01L33/46

Abstract:
An optoelectronic device with a multi-layer contact is described. The optoelectronic device can include an n-type semiconductor layer having a surface. A mesa can be located over a first portion of the surface of the n-type semiconductor layer and have a mesa boundary. An n-type contact region can be located over a second portion of the surface of the n-type semiconductor contact layer entirely distinct from the first portion, and be at least partially defined by the mesa boundary. A first n-type metallic contact layer can be located over at least a portion of the n-type contact region in proximity of the mesa boundary, where the first n-type metallic contact layer forms an ohmic contact with the n-type semiconductor layer. A second metallic contact layer can be located over a second portion of the n-type contact region, where the second metallic contact layer is formed of a reflective metallic material.
Public/Granted literature
- US20180069154A1 Contact Configuration for Optoelectronic Device Public/Granted day:2018-03-08
Information query
IPC分类: