- Patent Title: Plasmon-excited electron beam array for complementary patterning
-
Application No.: US16128441Application Date: 2018-09-11
-
Publication No.: US10861668B2Publication Date: 2020-12-08
- Inventor: Liang Pan , Xianfan Xu
- Applicant: Purdue Research Foundation
- Applicant Address: US IN West Lafayette
- Assignee: Purdue Research Foundation
- Current Assignee: Purdue Research Foundation
- Current Assignee Address: US IN West Lafayette
- Agency: Purdue Research Foundation
- Main IPC: H01J37/10
- IPC: H01J37/10 ; H01J37/06 ; H01J37/12 ; H01J37/317 ; G02B5/00 ; H01J37/073

Abstract:
A system for generating an electron beam array, comprising a light source, a first substrate having a plurality of plasmonic lenses mounted thereon, the plasmonic lenses configured to received light from the light source and produce an electron emission, and a plurality of electrostatic microlenses configured to focus the electron emissions into a beam for focusing on a wafer substrate. A light source modulator and digital micro mirror may be included which captures light from the light source and projects light beamlets on the plasmonic lenses.
Public/Granted literature
- US20190019648A1 PLASMON-EXCITED ELECTRON BEAM ARRAY FOR COMPLEMENTARY PATTERNING Public/Granted day:2019-01-17
Information query