公开(公告)号：US20250157779A1

公开(公告)日：2025-05-15

申请号：US18506957

申请日：2023-11-10

Applicant: FEI Company

Inventor： Radovan Vašina ,  Bohuslav Sed'a ,  Mostafa Maazouz ,  Lukáš Král

IPC: H01J37/05 ,  H01J37/04 ,  H01J37/10 ,  H01J37/147

Abstract: Charged-particle beam (CPB) optical systems can include a beam acceptance aperture plate defining a first acceptance aperture and at least one second acceptance aperture, situated with respect to a CPB source so that a first CPB is transmitted by the first acceptance aperture and a second CPB is transmitted by a second acceptance aperture. A CPB lens is situated to receive the first and second CPBs from the beam acceptance aperture plate and direct the first and second CPBs towards a filter aperture plate to transmit selected spectral portion of the second CPB. The selected spectral component of the first CPB can be selectively directed to a workpiece by a beam steering deflector along the same axis. In some examples, the first and second CPBs have different beam currents and only one is directed to a workpiece.

公开(公告)号：US12300461B2

公开(公告)日：2025-05-13

申请号：US17822530

申请日：2022-08-26

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Björn Gamm ,  Erik Essers

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/244

Abstract: A particle beam device has a particle source, an extraction stop, an anode stop and a beam tube. A driver system of the particle beam device is configured to apply an electrical excitation stop potential to the extraction stop, to apply an electrical anode stop potential, able to be set in a variable manner, to the anode stop and to apply an electrical beam tube potential to the beam tube. A controller of the particle beam device is configured to control the driver system such that a voltage between the extraction stop and the anode stop is able to be set in a variable manner, as a result of which a current strength of the particle beam passing through the aperture of the anode stop is able to be set in a variable manner.

公开(公告)号：US12293895B2

公开(公告)日：2025-05-06

申请号：US18379400

申请日：2023-10-12

Applicant: Carl Zeiss SMT GmbH

Inventor： Eugen Foca ,  Amir Avishai ,  Thomas Korb ,  Daniel Fischer

IPC: H01J37/147 ,  H01J37/10 ,  H01J37/26 ,  H01J37/28

Abstract: The present invention relates to a charged particle beam system comprising a deflection subsystem configured to deflect a charged particle beam in a deflection direction based on a sum of analog signals generated by separate digital to analog conversion of a first digital signal and a second digital signal. The present invention further relates to a method of configuring the charged particle beam system so that each of a plurality of regions of interest can be scanned by varying only the first digital signal while the second digital signal is held constant at a value associated with the respective region of interest. The present invention further relates to a method of recording a plurality of images of the regions of interest at the premise of reduced interference due to charge accumulation.

公开(公告)号：US12288664B2

公开(公告)日：2025-04-29

申请号：US17695879

申请日：2022-03-16

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Dirk Preikszas ,  Michael W. Phaneuf

IPC: H01J37/147 ,  H01J37/08 ,  H01J37/09 ,  H01J37/10 ,  H01J37/244

Abstract: The invention relates to a particle beam device (100) for imaging, analyzing and/or processing an object (114). The particle beam device (100) comprises a first particle beam generator (300) for generating a first particle beam, wherein the first particle beam generator (300) has a first generator beam axis (301), wherein an optical axis (OA) of the particle beam device (100) and the first generator beam axis (301) are identical; a second particle beam generator (400) for generating a second particle beam, wherein the second particle beam generator (400) has a second generator beam axis (401), wherein the optical axis (OA) and the second generator beam axis (401) are arranged at an angle being different from 0° and 180°; a deflection unit (500) for deflecting the second particle beam from the second generator beam axis (401) to the optical axis (OA) and along the optical axis (OA), wherein the deflection unit (500) has a first opening (501) and a second opening (502) being different from the first opening (501), wherein the optical axis (OA) runs through the first opening (501), wherein the second generator beam axis (401) runs through the second opening (502); an objective lens (107) for focusing the first particle beam or the second particle beam onto the object (114), wherein the optical axis (OA) runs through the objective lens (107); and at least one detector (116, 121, 122) for detecting interaction particles and/or interaction radiation.

公开(公告)号：US12283456B2

公开(公告)日：2025-04-22

申请号：US18079074

申请日：2022-12-12

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Andreas Schmaunz ,  Gero Walter ,  Bernd Stenke ,  Gerald Schmid

IPC: H01J37/16 ,  H01J37/10 ,  H01J37/317

Abstract: A gas reservoir that receives a precursor has a gas-receiving unit which is arranged in a first receiving unit of a basic body and a sliding unit which is arranged movably in a second receiving unit of the basic body. The gas-receiving unit has a movable closure unit for opening or closing a gas outlet opening of the gas-receiving unit. In a first position of the sliding unit, a first opening of a sliding-unit line device is fluidically connected to a first basic body opening and a second opening of the sliding-unit line device is fluidically connected to a second basic body opening. In the second position of the sliding unit, the first opening is arranged at an inner wall of the second receiving unit and the second opening is arranged at the movable closure unit.

公开(公告)号：US20240387141A1

公开(公告)日：2024-11-21

申请号：US18554185

申请日：2022-04-14

Applicant: The Regents of the University of California

Inventor： Tamir Gonen

IPC: H01J37/22 ,  H01J37/10 ,  H01J37/20 ,  H01J37/295

Abstract: An integrated microcrystal electron diffraction system and method are provided that include an electron source, a sample assembly configured to retain a sample, a camera assembly, and a control system. The control system pre-screens the sample on the sample assembly, collects image data of the sample via the camera assembly, and outputs microcrystal electron diffraction data based on the image data. Pre-screening includes capturing at least one pre-screen diffraction image of the sample; determining a position for the sample for imaging based on the at least one pre-screen diffraction image; and controlling the sample assembly to position the sample at the position. Collecting the image data includes generating an electron beam towards the sample at the position; rotating the sample assembly; and capturing, by the camera assembly, scatterings of the electron beam by the sample as diffraction images while the sample assembly is rotated.

公开(公告)号：US20240363304A1

公开(公告)日：2024-10-31

申请号：US18509205

申请日：2023-11-14

Applicant: FEI Company

Inventor： Jaroslav Velcovský ,  Remco T. J. P. Geurts ,  Marek Melichar

IPC: H01J37/10 ,  H01J37/04 ,  H01J37/22 ,  H01J37/305

CPC classification number: H01J37/10 ,  H01J37/045 ,  H01J37/22 ,  H01J37/3053 ,  H01J2237/006

Abstract: Surface contamination and debris deposition associated with laser ablation or ion beam milling is reduced by combining a directed flow to a workpiece with suction at a suitable vacuum pressure. The vacuum pressure is typically selected so that any contaminants or debris have relatively short mean free paths to avoid build-up on distant surfaces in a vacuum chamber. A shutter can be used to shield portions of a charged-particle-beam optical column during processing. Processing at vacuum pressures associated with the relatively short MFPs can be combined with processing at vacuum pressures associated with relatively long MFPs to provide coarse and fine milling or ablation.

公开(公告)号：US20240339292A1

公开(公告)日：2024-10-10

申请号：US18748758

申请日：2024-06-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Yan REN ,  Marijke SCOTUZZI ,  Albertus Victor Gerardus MANGNUS ,  Erwin Paul SMAKMAN

IPC: H01J37/244 ,  H01J37/10 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/10 ,  H01J37/28

Abstract: There is provided a charged particle device for a charged particle inspection apparatus for projecting an array of sub-beams towards a sample, the charged particle device comprising: a charged particle optical element and a detector. The charged particle optical element has an up-beam surface having a plurality of openings to generate an array of sub-beams from a charged particle beam. In the charged particle optical element are defined: sub-beam apertures and monitoring apertures. The sub-beam aperture extend through the charged particle element for paths of the array of sub-beams towards a sample. The monitoring aperture extends through the charged particle element. The detector is in the monitoring aperture. At least part of the detector is down-beam of the up-beam surface. The detector measures a parameter of a portion of the charged particle beam incident on the detector.

公开(公告)号：US20240321547A1

公开(公告)日：2024-09-26

申请号：US18580269

申请日：2022-07-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Marco Jan-Jaco WIELAND

IPC: H01J37/22 ,  H01J37/10 ,  H01J37/147 ,  H01J37/244 ,  H01J37/317

CPC classification number: H01J37/226 ,  H01J37/10 ,  H01J37/1474 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/0453 ,  H01J2237/2443 ,  H01J2237/24592

Abstract: Charged-particle optical devices are disclosed. In one arrangement, a device includes a charged particle column and a light sensor. An objective lens array projects a plurality of beams towards a sample and has a plurality of electrodes arranged along a path of the plurality of beams. A plurality of scintillators receives signal particles emitted from the sample. Light is generated in response to the received signal particles. A light guiding arrangement guides light generated by the scintillators to the light sensor. The light guiding arrangement includes a mirror defining a plurality of apertures to allow passage of the plurality of beams through the mirror towards the sample.

公开(公告)号：US12057290B2

公开(公告)日：2024-08-06

申请号：US17572767

申请日：2022-01-11

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Hans Fritz ,  Ingo Mueller

IPC: H01J37/317 ,  H01J37/10 ,  H01J37/145 ,  H01J37/147 ,  H01J37/26 ,  H01J37/302

CPC classification number: H01J37/3177 ,  H01J37/10 ,  H01J37/145 ,  H01J37/147 ,  H01J37/263 ,  H01J37/3023 ,  H01J2237/0453 ,  H01J2237/04926

Abstract: A method includes operating a multiple particle beam system at different working points. The numerical aperture can be set for each of the working points in such a way that the resolution of the multiple particle beam system is optimal. In the process, the beam pitch between adjacent individual particle beams on the sample to be scanned is kept constant as a boundary condition. There are no mechanical reconfigurations of the system whatsoever for the purposes of varying the numerical aperture.