Invention Grant
- Patent Title: Position measurement system, zeroing method, lithographic apparatus and device manufacturing method
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Application No.: US16489439Application Date: 2018-02-06
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Publication No.: US10883816B2Publication Date: 2021-01-05
- Inventor: Maarten Jozef Jansen
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP17162292 20170322,EP18151242 20180111
- International Application: PCT/EP2018/052855 WO 20180206
- International Announcement: WO2018/171970 WO 20180927
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01B9/02

Abstract:
A position measurement system configured to measure a position of an object, the system including: a displacement interferometer having a first capture range; a time-of-flight sensor having a second capture range that is larger than the first capture range and having an inaccuracy that is smaller than the first capture range; and a processing unit, wherein the position measurement system has a zeroing mode in which the processing unit is configured to determine a coarse position of the object within the second capture range based on an output from the time-of-flight sensor, and in which the processing unit is configured to determine a fine position of the object based on the determined coarse position and an output from the displacement interferometer.
Information query
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