Invention Grant
- Patent Title: Single-electron transistor with wrap-around gate
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Application No.: US16431862Application Date: 2019-06-05
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Publication No.: US10886391B2Publication Date: 2021-01-05
- Inventor: Kangguo Cheng , Xin Miao , Wenyu Xu , Chen Zhang
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Tutunjian & Bitetto, P.C.
- Agent Daniel Morris
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L29/66 ; H01L29/423 ; H01L29/12 ; H01L29/06 ; H01L29/10

Abstract:
Transistors and methods of forming the same include forming a fin that has an active layer between two sacrificial layers. Material is etched away from the two sacrificial layers in a region of the fin. A gate stack is formed around the active layer in the region. The active layer is etched after forming the gate stack to form a quantum dot.
Public/Granted literature
- US20190288097A1 SINGLE-ELECTRON TRANSISTOR WITH WRAP-AROUND GATE Public/Granted day:2019-09-19
Information query
IPC分类: