Invention Grant
- Patent Title: Method for producing a thin film, method for producing a magnetic disk, method for producing a nanoimprint mold, and apparatus for producing a thin film
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Application No.: US15895114Application Date: 2018-02-13
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Publication No.: US10888895B2Publication Date: 2021-01-12
- Inventor: Hiroshi Tani , Hiroshi Sakai , Eishin Yamakawa , Kazuki Shindo
- Applicant: SHOWA DENKO K.K. , A SCHOOL CORPORATION KANSAI UNIVERSITY
- Applicant Address: JP Tokyo; JP Suita
- Assignee: SHOWA DENKO K.K.,A SCHOOL CORPORATION KANSAI UNIVERSITY
- Current Assignee: SHOWA DENKO K.K.,A SCHOOL CORPORATION KANSAI UNIVERSITY
- Current Assignee Address: JP Tokyo; JP Suita
- Agency: Sughrue Mion, PLLC
- Priority: JP2017-046316 20170310
- Main IPC: C23C16/48
- IPC: C23C16/48 ; B05D1/00 ; G11B5/84 ; G03F7/00 ; C23C16/503 ; G11B5/725 ; B29C33/58 ; B29C33/62 ; B29C33/38 ; G11B5/72

Abstract:
A film production method for producing a thin film on a surface of a workpiece, including the steps of: disposing the workpiece in a chamber; supplying a process gas into the chamber with the inside of the chamber being maintained at a predetermined pressure; applying a light having an energy between 3 eV and 10 eV to the surface of the workpiece to cause a photoelectron to be emitted from the surface of the workpiece; and applying an AC electric field to the surface of the workpiece, wherein the AC electric field has an electric field intensity causing a Townsend discharge to occur without generating a glow discharge plasma.
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