Invention Grant
- Patent Title: Visualization performance metrics of computational analyses of design layouts
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Application No.: US16316465Application Date: 2017-06-23
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Publication No.: US10896282B2Publication Date: 2021-01-19
- Inventor: Taksh Pandey , Mark Christopher Simmons
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2017/065593 WO 20170623
- International Announcement: WO2018/010940 WO 20180118
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06F30/398 ; G03F1/36 ; G03F7/20

Abstract:
A process, including: obtaining data specifying a layout of a lithographic pattern; obtaining performance metrics of a computational analysis of the layout, the performance metrics indicating performance of one or more computer processes performing respective portions of the computational analysis; correlating the performance metrics to portions of the layout processed during measurement of the respective performance metrics; and generating a three or higher dimensional visualization based on a result of correlating the performance metrics to portions of the layout processed during measurement, wherein at least some of the visualization dimensions indicate relative positions of portions of the layout and at least some of the visualization dimensions indicate a performance metric correlated to the respective portions.
Public/Granted literature
- US20190294753A1 VISUALIZATION PERFORMANCE METRICS OF COMPUTATIONAL ANALYSES OF DESIGN LAYOUTS Public/Granted day:2019-09-26
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