Invention Grant
- Patent Title: Extreme ultraviolet light generation system, laser beam size controlling method, and electronic device manufacturing method
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Application No.: US16853585Application Date: 2020-04-20
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Publication No.: US10908429B2Publication Date: 2021-02-02
- Inventor: Takayuki Yabu , Yuichi Nishimura
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Priority: JP2019-110286 20190613
- Main IPC: G02B27/09
- IPC: G02B27/09 ; G03F7/20 ; H05G2/00 ; H01S3/00 ; H01S3/223

Abstract:
An extreme ultraviolet light generation system according to one aspect of the present disclosure includes: a pulse laser apparatus configured to output a pulse laser beam, the pulse laser beam being supplied to a predetermined region in a chamber in which plasma containing extreme ultraviolet light is to be generated; a sensor configured to detect a beam size of the pulse laser beam; an actuator configured to change the beam size; and a controller. The controller performs, based on a first algorithm, first control that controls the actuator by a first control amount in a beam size minifying direction when the beam size has exceeded a first upper limit threshold in one burst duration, and then performs, based on a second algorithm, second control that controls the actuator by a second control amount smaller than the first control amount so that the beam size becomes closer to a target value.
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