Invention Grant
- Patent Title: Method and apparatus for pattern fidelity control
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Application No.: US16468063Application Date: 2017-11-28
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Publication No.: US10908515B2Publication Date: 2021-02-02
- Inventor: Tanbir Hasan , Vivek Kumar Jain , Stefan Hunsche , Bruno La Fontaine
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2017/080704 WO 20171128
- International Announcement: WO2018/114246 WO 20180628
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00
Abstract:
A method of topography determination, the method including: obtaining a first focus value derived from a computational lithography model modeling patterning of an unpatterned substrate or derived from measurements of a patterned layer on an unpatterned substrate; obtaining a second focus value derived from measurement of a substrate having a topography; and determining a value of the topography from the first and second focus values.
Public/Granted literature
- US20200019069A1 METHOD AND APPARATUS FOR PATTERN FIDELITY CONTROL Public/Granted day:2020-01-16
Information query
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