Invention Grant
- Patent Title: TEM-based metrology method and system
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Application No.: US16488974Application Date: 2018-02-27
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Publication No.: US10916404B2Publication Date: 2021-02-09
- Inventor: Vladimir Machavariani , Michael Shifrin , Daniel Kandel , Victor Kucherov , Igor Ziselman , Ronen Urenski , Matthew Sendelbach
- Applicant: NOVA MEASURING INSTRUMENTS LTD.
- Applicant Address: IL Rehovot
- Assignee: NOVA MEASURING INSTRUMENTS LTD.
- Current Assignee: NOVA MEASURING INSTRUMENTS LTD.
- Current Assignee Address: IL Rehovot
- Agency: Alphapatent Associates, Ltd
- Agent Daniel J. Swirsky
- International Application: PCT/IL2018/050220 WO 20180227
- International Announcement: WO2018/154587 WO 20180830
- Main IPC: H01J37/26
- IPC: H01J37/26 ; G06T7/00 ; G06T7/60 ; H01J37/22

Abstract:
A control system is presented for use in measuring one or more parameters of a three-dimensional patterned structure. The control system is configured as a computer system comprising a data processor configured to receive and process raw measured TEM image data, TEMmeas, and generate output data indicative of one or more parameters of a patterned structure. The data processor comprises an optimization module configured and operable to utilize data indicative of one or more parameters of TEM measurement mode and perform a fitting procedure between the raw measured TEM image data, TEMmeas, and a predetermined simulated TEM image data, TEMsimui based on a parametrized three-dimensional model of features of the patterned structure, and generate simulated image data corresponding to a best fit condition, to thereby enable determination therefrom of the one or more parameters of the structure.
Public/Granted literature
- US20190393016A1 TEM-BASED METROLOGY METHOD AND SYSTEM Public/Granted day:2019-12-26
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