Invention Grant
- Patent Title: NOR flash memory and method of fabricating the same
-
Application No.: US16235329Application Date: 2018-12-28
-
Publication No.: US10916558B2Publication Date: 2021-02-09
- Inventor: Riichiro Shirota
- Applicant: Winbond Electronics Corp.
- Applicant Address: TW Taichung
- Assignee: Winbond Electronics Corp.
- Current Assignee: Winbond Electronics Corp.
- Current Assignee Address: TW Taichung
- Agency: Muncy, Geissler, Olds & Lowe, PC
- Priority: JP2018-074365 20180409
- Main IPC: H01L27/11582
- IPC: H01L27/11582 ; H01L27/11565 ; H01L27/1157 ; G11C16/16 ; G11C16/26 ; H01L21/28 ; H01L27/11556 ; H01L27/11519 ; H01L27/11524

Abstract:
NOR flash memory that includes three-dimensional memory cells is provided. In the NOR flash memory of the present disclosure, one memory cell includes one memory transistor and one selection transistor. A common source 5 is formed over a silicon substrate 9, and an active region 3 extending in a vertical direction to electrically connect to the common source 5 is formed. A control gate 4 of the memory transistor and a selection gate line 2 of the selection transistor are formed to surround a side portion of the active region 3, and a top portion of the active region 3 is electrically connected to a bit line 1.
Public/Granted literature
- US20190312053A1 NOR FLASH MEMORY AND METHOD OF FABRICATING THE SAME Public/Granted day:2019-10-10
Information query
IPC分类: