Invention Grant
- Patent Title: Laser apparatus and EUV light generating system
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Application No.: US16674793Application Date: 2019-11-05
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Publication No.: US10925143B2Publication Date: 2021-02-16
- Inventor: Katsuhiko Wakana
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G02B26/08

Abstract:
A laser apparatus includes an optical element disposed on a laser beam axis, an actuator configured to displace the optical element to displace the laser beam axis, a driving amount monitor configured to monitor a driving amount of the actuator, an optical axis monitor disposed along the laser beam axis and configured to monitor the laser beam axis, and a control unit configured to control the actuator based on a monitoring result of the optical axis monitor and determine abnormality of the optical element based on a monitoring result of the driving amount monitor.
Public/Granted literature
- US20200077500A1 LASER APPARATUS AND EUV LIGHT GENERATING SYSTEM Public/Granted day:2020-03-05
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