- Patent Title: Methods and apparatus for gettering impurities in semiconductors
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Application No.: US16327713Application Date: 2016-09-30
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Publication No.: US10937665B2Publication Date: 2021-03-02
- Inventor: Aaron D. Lilak , Harold W. Kennel , Patrick Morrow , Rishabh Mehandru , Stephen M. Cea
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Green, Howard & Mughal LLP
- International Application: PCT/US2016/054855 WO 20160930
- International Announcement: WO2018/063350 WO 20180405
- Main IPC: H01L21/322
- IPC: H01L21/322 ; H01L21/265 ; H01L21/768 ; H01L21/38 ; H01L21/70 ; H01L23/26
Abstract:
Methods and apparatus for gettering impurities in semiconductors are disclosed. A disclosed example multilayered die includes a substrate material, a component layer below the substrate material, and an impurity attractant region disposed in the substrate material.
Public/Granted literature
- US20190189464A1 METHODS AND APPARATUS FOR GETTERING IMPURITIES IN SEMICONDUCTORS Public/Granted day:2019-06-20
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