Invention Grant
- Patent Title: Plasma cell for providing VUV filtering in a laser-sustained plasma light source
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Application No.: US15895868Application Date: 2018-02-13
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Publication No.: US10976025B2Publication Date: 2021-04-13
- Inventor: Ilya Bezel , Anatoly Shchemelinin , Eugene Shifrin , Matthew Panzer , Matthew Derstine , Jincheng Wang , Anant Chimmalgi , Rajeev Patil , Rudolf Brunner
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: H01J61/52
- IPC: H01J61/52 ; H01J61/40 ; F21V9/06 ; H01J61/12 ; H01J61/14 ; H01J61/16 ; H01J61/20 ; H01J61/34 ; H01J61/35 ; H01J65/04

Abstract:
A plasma cell for use in a laser-sustained plasma light source includes a plasma bulb configured to contain a gas suitable for generating a plasma. The plasma bulb is transparent to light from a pump laser, wherein the plasma bulb is transparent to at least a portion of a collectable spectral region of illumination emitted by the plasma. The plasma bulb of the plasma cell is configured to filter short wavelength radiation, such as VUV radiation, emitted by the plasma sustained within the bulb in order to keep the short wavelength radiation from impinging on the interior surface of the bulb.
Public/Granted literature
- US20180172240A1 Plasma Cell for Providing VUV Filtering in a Laser-Sustained Plasma Light Source Public/Granted day:2018-06-21
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