Invention Grant
- Patent Title: Method and apparatus for controlling pattern-width of coating liquid dispensed from a nozzle
-
Application No.: US16234920Application Date: 2018-12-28
-
Publication No.: US10987691B2Publication Date: 2021-04-27
- Inventor: Byung Kook Yoon , Ju Yeop Jang
- Applicant: TTNS INC.
- Applicant Address: KR Gyeonggi-do
- Assignee: TTNS INC.
- Current Assignee: TTNS INC.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Roberts Calderon Safran & Cole P.C.
- Priority: KR10-2018-0000915 20180103
- Main IPC: B05D1/02
- IPC: B05D1/02 ; B05B12/08 ; B05B12/12 ; B05B12/00 ; H05K13/04

Abstract:
Disclosed is a method for controlling the pattern-width of a coating liquid dispensed from a nozzle. The method includes the steps of: dispensing the coating liquid downward from the nozzle in a dispensing position on a measurement reference line to photograph with a camera positioned at a predetermined horizontal distance from the measurement reference line arranged perpendicularly to a coating reference surface; calculating the pattern-width of the coating liquid on the coating reference surface from image data obtained by photographing the coating liquid dispensed from the nozzle in the dispensing position with the camera; comparing the calculated pattern-width of the coating liquid with a coating liquid reference pattern-width; and adjusting dispensing pressure by increasing or decreasing pressure of air supplied to a pressure container that provides the coating liquid to the nozzle when the calculated pattern-width of the coating liquid is outside the reference allowed error.
Public/Granted literature
- US20190201929A1 METHOD AND APPARATUS FOR CONTROLLING PATTERN-WIDTH OF COATING LIQUID DISPENSED FROM A NOZZLE Public/Granted day:2019-07-04
Information query