Invention Grant
- Patent Title: Anti-reflection optical substrates and methods of manufacture
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Application No.: US16292771Application Date: 2019-03-05
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Publication No.: US11009794B2Publication Date: 2021-05-18
- Inventor: Parag Vinayak Kelkar
- Applicant: ASML Holding N.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Holding N.V.
- Current Assignee: ASML Holding N.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03F7/09
- IPC: G03F7/09 ; H01L21/027 ; G02B1/113 ; H01L21/311 ; G02B1/118 ; G03F7/20 ; G03F1/46 ; B82Y40/00
Abstract:
A substrate provided with an anti-reflective coating where the anti-reflective coating is made up of a layer of nanostructures. The nanostructures may be formed by depositing a material such as SiO2 and then using a process such as reactive ion etching in conjunction with an inductively coupled plasma source. Other aspects of the fabrication process are also disclosed.
Public/Granted literature
- US20190278179A1 ANTI-REFLECTION OPTICAL SUBSTRATES AND METHODS OF MANUFACTURE Public/Granted day:2019-09-12
Information query
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