公开(公告)号：US12189310B2

公开(公告)日：2025-01-07

申请号：US17790341

申请日：2020-12-04

Applicant: ASML Holding N.V.

Inventor： Matthew Lipson ,  Mehmet Ali Akbas

IPC: G03F7/20 ,  C03C27/00 ,  G03F7/00 ,  H01L21/683

Abstract: Systems, apparatuses, and methods are provided for manufacturing an electrostatic clamp. An example method can include forming, during a first duration of time comprising a first time, a top clamp comprising a first set of electrodes and a plurality of burls. The method can further include forming, during a second duration of time comprising a second time that overlaps the first time, a core comprising a plurality of fluid channels configured to carry a thermally conditioned fluid. The method can further include forming, during a third duration of time comprising a third time that overlaps the first time and the second time, a bottom clamp comprising a second set of electrodes. In some aspects, the example method can include manufacturing the electrostatic clamp without an anodic bond.

公开(公告)号：US20240419089A1

公开(公告)日：2024-12-19

申请号：US18821789

申请日：2024-08-30

Applicant: ASML Holding N.V.

Inventor： Keane Michael LEVY

IPC: G03F7/00

Abstract: Apparatus for and method of removing a contaminant from a working surface of a lithography support such as a reticle or wafer stage in an EUV or a DUV photolithography system in which a base supporting the substrate is provided with a surface profile so as to be thicker towards a middle portion of the base so that when a substrate supported by the base is pressed between the working surface and the base the contaminant is transferred from the working surface to the substrate.

公开(公告)号：US12140872B2

公开(公告)日：2024-11-12

申请号：US17796640

申请日：2021-01-21

Applicant: ASML Holding N.V.

Inventor： Mohamed Swillam ,  Tamer Mohamed Tawfik Ahmed Mohamed Elazhary ,  Stephen Roux ,  Yevgeniy Konstantinovich Shmarev

IPC: G03F7/00 ,  G03F9/00

Abstract: A compact sensor apparatus having an illumination beam, a beam shaping system, a polarization modulation system, a beam projection system, and a signal detection system. The beam shaping system is configured to shape an illumination beam generated from the illumination system and generate a flat top beam spot of the illumination beam over a wavelength range from 400 nm to 2000 nm. The polarization modulation system is configured to provide tenability of linear polarization state of the illumination beam. The beam projection system is configured to project the flat top beam spot toward a target, such as an alignment mark on a substrate. The signal detection system is configured to collect a signal beam comprising diffraction order sub-beams generated from the target, and measure a characteristic (e.g., overlay) of the target based on the signal beam.

公开(公告)号：US12124177B2

公开(公告)日：2024-10-22

申请号：US17782622

申请日：2020-11-18

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Mohamed Swillam ,  Simon Reinald Huisman ,  Justin Lloyd Kreuzer

IPC: G03F7/00 ,  G03F9/00

CPC classification number: G03F7/706851 ,  G03F7/70633 ,  G03F7/7085 ,  G03F9/7046 ,  G03F9/7088

Abstract: A detection system (200) includes an illumination system (210), a first optical system (232), a phase modulator (220), a lock-in detector (255), and a function generator (230). The illumination system is configured to transmit an illumination beam (218) along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target (204) on a substrate (202). The first optical system is further configured to transmit a signal beam including diffraction order sub-beams (222, 224, 226) that are diffracted by the diffraction target. The phase modulator is configured to modulate the illumination beam or the signal beam based on a reference signal. The lock-in detector is configured to collect the signal beam and to measure a characteristic of the diffraction target based on the signal beam and the reference signal. The function generator is configured to generate the reference signal for the phase modulator and the lock-in detector.

公开(公告)号：US20240319608A1

公开(公告)日：2024-09-26

申请号：US18262467

申请日：2022-01-16

Applicant: ASML Holding N.V.

Inventor： Roberto B. WIENER ,  Kalyan Kumar MANKALA ,  Todd R. DOWNEY

IPC: G03F7/00

CPC classification number: G03F7/70141 ,  G03F7/70075 ,  G03F7/70133 ,  G03F7/7015 ,  G03F7/70191 ,  G03F7/7085

Abstract: Systems, apparatuses, and methods are provided for adjusting illumination slit uniformity in a lithographic apparatus. An example method can include irradiating, by a radiation source, a portion of a finger assembly with radiation. The example method can further include receiving, by a radiation detector, at least a portion of the radiation in response to the irradiating of the portion of the finger assembly. The example method can further include determining, by a processor, a change in a shape of the finger assembly based on the received radiation. The example method can further include generating, by the processor, a control signal configured to modify a position of the finger assembly based on the determined change in the shape of the finger assembly. Subsequently, the example method can include transmitting, by the processor, the control signal to a motion control system coupled to the finger assembly.

公开(公告)号：US12066758B2

公开(公告)日：2024-08-20

申请号：US17728608

申请日：2022-04-25

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： David Ferdinand Vles ,  Erik Achilles Abegg ,  Aage Bendiksen ,  Derk Servatius Gertruda Brouns ,  Pradeep K. Govil ,  Paul Janssen ,  Maxim Aleksandrovich Nasalevich ,  Arnoud Willem Notenboom ,  Mária Péter ,  Marcus Adrianus Van De Kerkhof ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Willem-Pieter Voorthuijzen ,  James Norman Wiley

IPC: G03F7/20 ,  G03F1/22 ,  G03F1/62 ,  G03F1/64 ,  G03F7/00

CPC classification number: G03F1/64 ,  G03F1/22 ,  G03F1/62 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70983

Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.

公开(公告)号：US11966169B2

公开(公告)日：2024-04-23

申请号：US17029845

申请日：2020-09-23

Applicant: ASML Holding N.V.

Inventor： Mohamed Swillam ,  Tamer Mohamed Tawfik Ahmed Elazhary ,  Stephen Roux ,  Yuxiang Lin ,  Justin Lloyd Kreuzer

IPC: G03F7/00 ,  G01B11/14 ,  G01B11/27 ,  G02B6/12 ,  G02B6/293 ,  H01L21/67

CPC classification number: G03F7/70633 ,  G01B11/14 ,  G01B11/272 ,  G02B6/12007 ,  G03F7/70575 ,  G03F7/70616 ,  G03F7/7085 ,  G01B2210/56 ,  G02B6/29301 ,  G02B6/29395 ,  G03F7/70608 ,  H01L21/67259

Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.

公开(公告)号：US11892779B2

公开(公告)日：2024-02-06

申请号：US17772201

申请日：2020-10-21

Applicant: ASML HOLDING N.V.

Inventor： Victor Antonio Perez-Falcon

IPC: G03F7/00 ,  G02B7/18

CPC classification number: G03F7/70891 ,  G02B7/1815 ,  G03F7/7015

Abstract: An optical element and a lithographic apparatus including the optical element. The optical element includes a first member having a curved optical surface and a heat transfer surface, and a second member that comprises at least one recess, the at least one recess sealed against the heat transfer surface to form at least one closed channel between the first member and the second member to allow fluid to flow therethrough for thermal conditioning of the curved optical surface. In an embodiment, one or more regions of the heat transfer surface exposed to the at least one closed channel are positioned along a curved profile similar to that of the curved optical surface.

公开(公告)号：US20240036485A1

公开(公告)日：2024-02-01

申请号：US18269191

申请日：2021-12-02

Applicant: ASML Netheriands B. V. ,  ASML Holding N.V.

Inventor： Arjan Johannes Anton BEUKMAN ,  Sebastianus Adrianus GOORDEN ,  Stephen ROUX ,  Sergel SOKOLOV ,  Filippo ALPEGGIANI

IPC: G03F9/00 ,  G03F7/00

CPC classification number: G03F9/7065 ,  G03F7/70625 ,  G03F9/7046

Abstract: A method includes irradiating a target structure with sequential illumination shots, directing scattered beams from the target structure towards an imaging detector, generating a detection signal using the imaging detector, and determining a property of the target structure based on at least the detection signal. An integration time for each illumination shot of the sequential illumination shots is selected so to reduce a low frequency error.

公开(公告)号：US20240027913A1

公开(公告)日：2024-01-25

申请号：US18255261

申请日：2021-12-02

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Sergei SOKOLOV ,  Simon Reinald HUISMAN ,  Jin LIAN ,  Sebastianus Adrianus GOORDEN ,  Muhsin ERALP ,  Henricus Petrus Maria PELLEMANS ,  Justin Lloyd KREUZER

IPC: G03F7/00

CPC classification number: G03F7/70091 ,  G03F7/70625 ,  G03F7/70633

Abstract: A metrology system (400) includes a multi-source radiation system. The multi-source radiation system includes a waveguide device (502) and the multi-source radiation system is configured to generate one or more beams of radiation. The metrology system (400) further includes a coherence adjuster (500) including a multimode waveguide device (504). The multimode waveguide device (504) includes an input configured to receive the one or more beams of radiation from the multi-source radiation system (514) and an output (518) configured to output a coherence adjusted beam of radiation for irradiating a target (418). The metrology system (400) further includes an actuator (506) coupled to the waveguide device (502) and configured to actuate the waveguide device (502) so as to change an impingement characteristic of the one or more beams of radiation at the input of the multimode waveguide device (504).