Invention Grant
- Patent Title: Valve device, flow control method using the same, and semiconductor manufacturing method
-
Application No.: US16463428Application Date: 2017-11-02
-
Publication No.: US11022224B2Publication Date: 2021-06-01
- Inventor: Toshihide Yoshida , Tomohiro Nakata , Tsutomu Shinohara , Toshiyuki Inada , Takashi Funakoshi , Hidenobu Sato , Tomoko Yuhara
- Applicant: FUJIKIN INCORPORATED
- Applicant Address: JP Osaka
- Assignee: FUJIKIN INCORPORATED
- Current Assignee: FUJIKIN INCORPORATED
- Current Assignee Address: JP Osaka
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JPJP2016-233673 20161130
- International Application: PCT/JP2017/039732 WO 20171102
- International Announcement: WO2018/100968 WO 20180607
- Main IPC: F16K31/122
- IPC: F16K31/122 ; F16K31/00 ; G05D16/20 ; F16K7/14 ; F16K31/02 ; H01L21/205

Abstract:
A valve device includes a valve body that defines flow paths, a diaphragm provided so as to be capable of opening and closing the flow paths, an operation member provided so as to be capable of moving in opening and closing directions that open and close the flow paths by operating the diaphragm, a main actuator that applies a driving force corresponding to an operating pressure applied in the opening direction or the closing direction of the opening and closing directions with respect to the operation member, a switching mechanism capable of selectively switching a position of the operation member that regulates a degree of opening of the flow paths between a first open position and a second open position in accordance with a magnitude of the operating pressure, and regulating mechanisms capable of independently regulating the first open position and the second open position.
Public/Granted literature
- US20200224776A1 VALVE DEVICE, FLOW CONTROL METHOD USING THE SAME, AND SEMICONDUCTOR MANUFACTURING METHOD Public/Granted day:2020-07-16
Information query