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    Valve device, flow control method using the same, and semiconductor manufacturing method
    4.
    发明授权
    Valve device, flow control method using the same, and semiconductor manufacturing method 有权

    公开(公告)号：US11098819B2

    公开(公告)日：2021-08-24

    申请号：US16347934

    申请日：2017-11-02

    Applicant: FUJIKIN INCORPORATED

    Inventor： Toshihide Yoshida ,  Tomohiro Nakata ,  Tsutomu Shinohara ,  Toshiyuki Inada ,  Takashi Funakoshi

    IPC: F16K31/122

    Abstract: A valve device that greatly reduces man-hours for flow adjustment includes a valve body that defines a flow path, a valve element provided so as to be capable of opening and closing the flow path of the valve body, an operation member that operates the valve element and is moveably provided between a closed position where the valve element closes the flow path and an open position where the valve element opens the flow path, set in advance, in opening and closing directions that allow the valve element to open and close the flow path, a main actuator that moves the operation member in the opening direction, and a piezoelectric actuator for adjusting a position of the operation member positioned in the open position.

    Fluid supply device and fluid supply method
    5.
    发明授权
    Fluid supply device and fluid supply method 有权

    公开(公告)号：US11569101B2

    公开(公告)日：2023-01-31

    申请号：US16634681

    申请日：2018-07-31

    Applicant: FUJIKIN INCORPORATED ,  TOKYO ELECTRON LTD.

    Inventor： Toshihide Yoshida ,  Yukio Minami ,  Tsutomu Shinohara

    IPC: H01L21/67 ,  H01L21/02

    Abstract: A fluid supply device and a fluid supply method capable of stably supplying a supercritical fluid includes a fluid supply device for supplying a fluid in a liquid state before being changed to a supercritical fluid toward a processing chamber. The fluid supply device comprises a condenser that condenses and liquefies a fluid in a gas state, a tank that stores the fluid condensed and liquefied by the condenser, a pump that pressure-feeds the liquefied fluid stored in the tank toward the processing chamber, and a heating means provided to a flow path communicating with a discharge side of the pump and for partially changing the liquid in the flow path to a supercritical fluid.

    Pressure-type flow rate control device
    7.
    发明授权
    Pressure-type flow rate control device 有权

    公开(公告)号：US10372145B2

    公开(公告)日：2019-08-06

    申请号：US15034002

    申请日：2014-11-25

    Applicant: FUJIKIN INCORPORATED

    Inventor： Takashi Hirose ,  Toshihide Yoshida ,  Atsushi Matsumoto ,  Kaoru Hirata ,  Nobukazu Ikeda ,  Kouji Nishino ,  Ryousuke Dohi ,  Katsuyuki Sugita

    IPC: F16K31/02 ,  G05D7/06 ,  F16K7/14 ,  H01L21/67 ,  F16K31/00

    Abstract: A pressure-type flow rate controller includes a body provided with a fluid passage which communicates a fluid inlet and a fluid outlet, a control valve for pressure control fixed to the body to open and close the fluid passage, an orifice arranged in the course of the fluid passage on the downstream side of the control valve, and a pressure sensor fixed to the body to detect the internal pressure of the fluid passage between the control valve and the orifice, wherein the fluid passage comprises a first passage portion communicating the control valve and a pressure detection chamber provided on a pressure detection surface of the pressure sensor, and a second passage portion spaced away from the first passage portion and communicating the pressure detection chamber and the orifice.

    DIAPHRAGM VALVE
    9.
    发明申请
    DIAPHRAGM VALVE 有权

    公开(公告)号：US20220275871A1

    公开(公告)日：2022-09-01

    申请号：US17622756

    申请日：2020-06-08

    Applicant: FUJIKIN INCORPORATED

    Inventor： Keisuke Ishibashi ,  Toshihide Yoshida ,  Tadayuki Yakushijin ,  Michio Yamaji ,  Tsutomu Shinohara

    IPC: F16K7/17 ,  F16K31/122

    Abstract: To provide a control valve with excellent durability performance without being restricted in terms of applications, such as usages under high pressures or high temperatures, as well as reduced generation of particles. A valve body forming an inflow passage and an outflow passage of a fluid; a valve seat formed at a peripheral edge of the inflow passage in the valve body; a diaphragm configured to connect and shut off the inflow passage and the outflow passage by coming into and out of contact with the valve seat; a diaphragm holder configured to press a central portion of the diaphragm; and an actuator configured to move the diaphragm holder are provided, includes a regulation mechanism configured to adjust a closing pressure generated between the valve seat and the diaphragm to a predetermined pressure.

    Fluid supply device and liquid discharge method of this device
    10.
    发明授权
    Fluid supply device and liquid discharge method of this device 有权

    公开(公告)号：US11322372B2

    公开(公告)日：2022-05-03

    申请号：US16635002

    申请日：2018-07-31

    Applicant: FUJIKIN INCORPORATED

    Inventor： Toshihide Yoshida ,  Yukio Minami ,  Tsutomu Shinohara

    IPC: B01J4/00 ,  H01L21/67

    Abstract: A fluid supply device includes a condenser, a tank that stores the fluid, a pump that pressure-feeds the fluid toward a processing chamber, a main pipe connecting the tank and the pump and transferring the liquid stored in the tank to the pump using a weight of the liquid, and a discharging pipe that is connected to the main pipe at a lowest position of the main pipe at one end, is opened to the atmosphere at the other end, and vaporizes and discharges the liquid in the tank and the main pipe to the outside. The discharging pipe is formed so that, after the liquid in the tank and the main pipe is fully discharged, a liquid pool that separates a space on the atmosphere side and a space on the main pipe side of the discharging pipe is temporarily produced in the discharging pipe.

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