Invention Grant
- Patent Title: Positioning device, magnetic support system and lithographic apparatus
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Application No.: US16647080Application Date: 2018-09-24
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Publication No.: US11022901B2Publication Date: 2021-06-01
- Inventor: Hessel Bart Koolmees , Johannes Petrus Martinus Bernardus Vermeulen
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP17195886 20171011
- International Application: PCT/EP2018/075764 WO 20180924
- International Announcement: WO2019/072529 WO 20190418
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A positioning device configured to position an object, the positioning device including: an object table configured to hold the object; an electromagnetic motor configured to displace the object table, the electromagnetic motor including: a coil assembly mounted to the object table, a superconductor assembly configured to co-operate with the coil assembly to generate a driving force on the object table, and a cryogenic enclosure configured to enclose the superconductor assembly and maintain the superconductor assembly in a superconductive state; a support for supporting the electromagnetic motor; and an electromagnetic support configured to suspend the cryogenic enclosure relative to the support, thereby maintaining a gap between the cryogenic enclosure and the support.
Public/Granted literature
- US20200278616A1 POSITIONING DEVICE, MAGNETIC SUPPORT SYSTEM AND LITHOGRAPHIC APPARATUS Public/Granted day:2020-09-03
Information query
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