Invention Grant
- Patent Title: Lithographic method and apparatus
-
Application No.: US16955324Application Date: 2018-12-03
-
Publication No.: US11036144B2Publication Date: 2021-06-15
- Inventor: Przemyslaw Aleksander Klosiewicz , Bogathi Vishnu Vardhana Reddy , Syed Umar Hassan Rizvi , James Robert Downes
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP17208336 20171219
- International Application: PCT/EP2018/083364 WO 20181203
- International Announcement: WO2019/120968 WO 20190627
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A method of determining a configuration of a projection system for a lithographic apparatus as an implementation of a quadratic programming problem with a penalty function. The method includes: receiving dependencies of one or more optical properties of the projection system on a configuration of a plurality of manipulators of the projection system; receiving a plurality of constraints which correspond to physical constraints of the manipulators; finding an initial configuration of the manipulators; and iteratively finding an output configuration of the manipulators. The iteration includes repeating the following steps: determining a set of the plurality of constraints that are violated; determining an updated configuration of the manipulators, the updated configuration of the manipulators being dependent on the set of the plurality of constraints that are violated and a penalty strength; and increasing the penalty strength. These steps are repeated until a convergence criterion is met.
Public/Granted literature
- US20210011389A1 LITHOGRAPHIC METHOD AND APPARATUS Public/Granted day:2021-01-14
Information query
IPC分类: