Invention Grant
- Patent Title: Conformal carbon film deposition
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Application No.: US16433101Application Date: 2019-06-06
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Publication No.: US11043379B2Publication Date: 2021-06-22
- Inventor: Pramit Manna , Abhijit Basu Mallick
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L21/02
- IPC: H01L21/02
Abstract:
Methods for depositing an amorphous carbon layer on a substrate are described. A substrate is exposed to a carbon precursor having a structure of Formula (I). Also described are methods of etching a substrate, including forming an amorphous carbon hard mask on a substrate by exposing the substrate to a carbon precursor having the structure of Formula (I).
Public/Granted literature
- US20190385845A1 Conformal Carbon Film Deposition Public/Granted day:2019-12-19
Information query
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