Invention Grant
- Patent Title: Laser apparatus and EUV light generation system
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Application No.: US16595782Application Date: 2019-10-08
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Publication No.: US11043784B2Publication Date: 2021-06-22
- Inventor: Tsukasa Hori , Yoshifumi Ueno , Takayuki Yabu , Yoshiaki Kurosawa
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Main IPC: H01S3/04
- IPC: H01S3/04 ; H01S3/23 ; H05G2/00

Abstract:
A laser apparatus includes: a plurality of envelope blocks each provided with an optical element and a first temperature sensor and covering part of a laser beam path, the optical element being disposed on the laser beam path, the first temperature sensor being configured to measure a first temperature of gas at a position away from the optical element; an envelope body including the envelope blocks and covering the laser beam path; and a control unit connected with each first temperature sensor and configured to specify an envelope block at which increase of the first temperature is measured in the envelope body as an envelope block at which anomaly is occurring.
Public/Granted literature
- US20200044407A1 LASER APPARATUS AND EUV LIGHT GENERATION SYSTEM Public/Granted day:2020-02-06
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