Invention Grant
- Patent Title: Mount, extreme ultraviolet light generation system, and device manufacturing method
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Application No.: US16985148Application Date: 2020-08-04
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Publication No.: US11061340B2Publication Date: 2021-07-13
- Inventor: Toshihiro Nishisaka
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A mount includes: A. a mount body including a holding unit that detachably holds a target generation device configured to output a target substance for extreme ultraviolet light generation as a droplet into a chamber; and B. a target position adjustment unit that is provided to the holding unit and configured to adjust a position of the target generation device relative to the chamber; and C. a movement mechanism that moves the mount body at least in a horizontal direction. The target position adjustment unit is a stage configured to move the target generation device in two directions orthogonal to a droplet emission axis.
Information query
IPC分类: