- Patent Title: Excimer laser apparatus and electronic-device manufacturing method
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Application No.: US16871758Application Date: 2020-05-11
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Publication No.: US11079686B2Publication Date: 2021-08-03
- Inventor: Keisuke Ishida , Masato Moriya , Natsuhiko Kouno , Takeshi Asayama , Takashi Kusama
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01J3/26 ; H01S3/036 ; H01S3/104 ; H01S3/225

Abstract:
An excimer laser apparatus according to the present disclosure includes an etalon spectrometer configured to measure a fringe waveform of a laser beam; and a controller configured to obtain area of a first ratio in a spectral space obtained based on a result of the measurement by the etalon spectrometer, calculate a first spectral line width of the laser beam based on the obtained area of the first ratio, and calibrate a first spectral line width based on a correlation function representing correlation between the first spectral line width and a second spectral line width of the laser beam measured by a reference meter.
Public/Granted literature
- US20200274315A1 EXCIMER LASER APPARATUS AND ELECTRONIC-DEVICE MANUFACTURING METHOD Public/Granted day:2020-08-27
Information query
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