Invention Grant
- Patent Title: Resistive random access memory structure and method for manufacturing the same
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Application No.: US16504491Application Date: 2019-07-08
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Publication No.: US11094880B2Publication Date: 2021-08-17
- Inventor: Wen-Jen Wang , Chun-Hung Cheng , Chuan-Fu Wang
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsinchu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, PC
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L27/24

Abstract:
A resistive random access memory structure includes a bottom electrode; a variable resistance layer disposed on the bottom electrode; a top electrode disposed on the variable resistance layer; a protection layer surrounding the variable resistance layer, wherein a top surface of the protection layer and a top surface of the top electrode are coplanar; and an upper interconnect structure disposed on the top electrode, wherein the upper interconnect structure is electrically connected to the top electrode and directly contacts a sidewall of the protection layer.
Public/Granted literature
- US20210013403A1 RESISTIVE RANDOM ACCESS MEMORY STRUCTURE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2021-01-14
Information query
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