Invention Grant
- Patent Title: Techniques for thermal treatment of electronic devices
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Application No.: US16421834Application Date: 2019-07-03
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Publication No.: US11107712B2Publication Date: 2021-08-31
- Inventor: Conor F. Madigan , Eliyahu Vronsky , Alexander Sou-Kang Ko , Justin Mauck
- Applicant: Kateeva, Inc.
- Applicant Address: US CA Newark
- Assignee: Kateeva, Inc.
- Current Assignee: Kateeva, Inc.
- Current Assignee Address: US CA Newark
- Agency: Hauptman Ham, LLP
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L51/00 ; H01L51/56 ; H01L21/673 ; B05D3/02

Abstract:
Apparatus and techniques are described herein for use in manufacturing electronic devices. Such as can include organic light emitting diode (OLED) devices. Such apparatus and techniques can include using one or more modules having a controlled environment. For example, a substrate can be received from a printing system located in a first processing environment, and the substrate can be provided a second processing environment, such as to an enclosed thermal treatment module comprising a controlled second processing environment. The second processing environment can include a purified gas environment having a different composition than the first processing environment.
Public/Granted literature
- US20200013649A1 APPARATUS AND TECHNIQUES FOR THERMAL TREATMENT OF ELECTRONIC DEVICES Public/Granted day:2020-01-09
Information query
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