Invention Grant
- Patent Title: Gas distribution plate for thermal deposition
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Application No.: US16523252Application Date: 2019-07-26
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Publication No.: US11110425B2Publication Date: 2021-09-07
- Inventor: Jared Ahmad Lee , Sanjeev Baluja , Joseph AuBuchon , Dhritiman Subha Kashyap , Michael Rice
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01J37/32
- IPC: H01J37/32 ; B01J8/18 ; B01J4/00
Abstract:
Apparatus and methods for providing high velocity gas flow showerheads for deposition chambers are described. The showerhead has a faceplate in contact with a backing plate that has a concave portion to provide a plenum between the backing plate and the faceplate. A plurality of thermal elements is within the concave portion of the backing plate and extends to contact the faceplate.
Public/Granted literature
- US20200030766A1 GAS DISTRIBUTION PLATE FOR THERMAL DEPOSITION Public/Granted day:2020-01-30
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