Invention Grant
- Patent Title: Defect candidate generation for inspection
-
Application No.: US16653939Application Date: 2019-10-15
-
Publication No.: US11114324B2Publication Date: 2021-09-07
- Inventor: Martin Plihal , Erfan Soltanmohammadi , Prasanti Uppaluri , Mohit Jani , Chris Maher
- Applicant: KLA Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA Corporation
- Current Assignee: KLA Corporation
- Current Assignee Address: US CA Milpitas
- Agent Ann Marie Mewherter
- Main IPC: H01L21/67
- IPC: H01L21/67 ; G01N21/88 ; G01N21/95 ; G01N21/956 ; H01J37/28 ; G06T7/00 ; G06T7/11 ; H01J37/22 ; G03F7/20

Abstract:
Systems and methods for detecting defect candidates on a specimen are provided. One method includes, after scanning of at least a majority of a specimen is completed, applying one or more segmentation methods to at least a substantial portion of output generated during the scanning thereby generating two or more segments of the output. The method also includes separately detecting outliers in the two or more segments of the output. In addition, the method includes detecting defect candidates on the specimen by applying one or more predetermined criteria to results of the separately detecting to thereby designate a portion of the detected outliers as the defect candidates.
Public/Granted literature
- US20200328104A1 Defect Candidate Generation for Inspection Public/Granted day:2020-10-15
Information query
IPC分类: