Invention Grant
- Patent Title: Method and apparatus for neutral beam processing based on gas cluster ion beam technology
-
Application No.: US16008585Application Date: 2018-06-14
-
Publication No.: US11199769B2Publication Date: 2021-12-14
- Inventor: Sean R. Kirkpatrick , Rangarajan Jagannathan
- Applicant: Exogenesis Corporation
- Applicant Address: US MA Billerica
- Assignee: Exogenesis Corporation
- Current Assignee: Exogenesis Corporation
- Current Assignee Address: US MA Billerica
- Agency: Burns & Levinson LLP
- Agent Jerry Cohen; Joseph P. Quinn
- Main IPC: G03F1/80
- IPC: G03F1/80 ; H01L21/311 ; H01L21/265 ; H01L21/02 ; G03F1/82 ; H05H3/02 ; H01J37/317 ; H01J37/147 ; H01J37/05 ; H01L21/321 ; H01J37/31 ; H01L29/36 ; B24B37/04
Abstract:
A method of processing a trench, via, hole, recess, void, or other feature that extends a depth into a substrate to a base or bottom and has an opening by irradiation with an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials at the base or bottom of the opening.
Public/Granted literature
- US20180299771A1 METHOD AND APPARATUS FOR NEUTRAL BEAM PROCESSING BASED ON GAS CLUSTER ION BEAM TECHNOLOGY Public/Granted day:2018-10-18
Information query
