Invention Grant
- Patent Title: Apparatus to reduce contamination in a plasma etching chamber
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Application No.: US16010239Application Date: 2018-06-15
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Publication No.: US11211282B2Publication Date: 2021-12-28
- Inventor: Xue Chang , Andrew Nguyen
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Main IPC: H01L21/687
- IPC: H01L21/687 ; C23C16/458 ; H01J37/32 ; C23C14/50

Abstract:
Embodiments of process kit components for use in a substrate support, and substrate supports incorporating same, are provided herein. In some embodiments, the substrate support may include a body, a grounding shell formed of an electrically conductive material disposed about the body, a liner formed of an electrically conductive material disposed about the grounding shell, where the liner includes an upper lip that extends inwardly towards the body, a metal fastener disposed through the upper lip to couple the liner to the grounding shell, and a first insulator ring disposed atop the upper lip of the liner and covering the metal fastener.
Public/Granted literature
- US20190385891A1 APPARATUS TO REDUCE COMTAMINATION IN A PLASMA ETCHING CHAMBER Public/Granted day:2019-12-19
Information query
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