Invention Grant
- Patent Title: EUV optical element having blister-resistant multilayer cap
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Application No.: US15038430Application Date: 2015-01-29
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Publication No.: US11215736B2Publication Date: 2022-01-04
- Inventor: Norbert Bowering
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: DiBerardino McGovern IP Group LLC
- Priority: EP14154265 20140207
- International Application: PCT/EP2015/051809 WO 20150129
- International Announcement: WO2015/117887 WO 20150813
- Main IPC: G02B1/14
- IPC: G02B1/14 ; G02B5/08 ; G21K1/06
Abstract:
A multilayer mirror having a cap with a multilayer structure including a top layer and a series of bilayers each having an absorber layer and a spacer layer, where the materials for the top layer, absorber layers, and spacer layers are chosen to resist blistering.
Public/Granted literature
- US20160349412A1 EUV OPTICAL ELEMENT HAVING BLISTER-RESISTANT MULTILAYER CAP Public/Granted day:2016-12-01
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