Invention Grant
- Patent Title: Magnetic memory structure
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Application No.: US16514523Application Date: 2019-07-17
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Publication No.: US11227990B2Publication Date: 2022-01-18
- Inventor: Ziaur Rahaman Shakh , I-Jung Wang , Jeng-Hua Wei
- Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Applicant Address: TW Hsinchu
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: H01L27/22
- IPC: H01L27/22 ; H01L43/02 ; H01F10/32 ; G11C11/16 ; H01L43/10

Abstract:
A magnetic memory structure is provided. The magnetic memory structure includes a magnetic tunneling junction (MTJ) layer and a heavy-metal layer. The MTJ layer includes a pinned-layer, a barrier-layer formed under the pinned-layer and a free-layer formed under the barrier-layer. The heavy-metal layer is formed under the free-layer. The barrier-layer has a first upper surface, the pinned-layer has a lower surface, and area of the first upper surface is larger than area of the lower surface.
Public/Granted literature
- US20210020827A1 MAGNETIC MEMORY STRUCTURE Public/Granted day:2021-01-21
Information query
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