Invention Grant
- Patent Title: Atomic layer deposition device for massively coating micro-nano particles
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Application No.: US16615060Application Date: 2019-04-15
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Publication No.: US11236421B2Publication Date: 2022-02-01
- Inventor: Rong Chen , Jiawei Li , Bin Shan , Xiao Liu , Kai Qu , Jing Zhang
- Applicant: Huazhong University of Science and Technology
- Applicant Address: CN Hubei
- Assignee: Huazhong University of Science and Technology
- Current Assignee: Huazhong University of Science and Technology
- Current Assignee Address: CN Hubei
- Agency: Hamre, Schumann, Mueller & Larson, P.C.
- Priority: CN201810614134.0 20180614
- International Application: PCT/CN2019/082668 WO 20190415
- International Announcement: WO2019/237820 WO 20191219
- Main IPC: C23C16/40
- IPC: C23C16/40 ; C23C16/44 ; C23C16/455 ; C23C16/52

Abstract:
An atomic layer deposition device for massively coating micro-nano particles, includes a reaction chamber and a particle container, in which an inlet port is provided at a lower end of the reaction chamber, and an inlet pipe for introducing a precursor or a carrier gas is provided in the inlet port; a chamber door is provided at an upper end of the reaction chamber, so that the particle container can be freely placed in or removed out of the reaction chamber; an air inlet hole is provided at a lower end of the particle container, and the inlet pipe enters the particle container through the air inlet hole.
Public/Granted literature
- US20210332478A1 ATOMIC LAYER DEPOSITION DEVICE FOR MASSIVELY COATING MICRO-NANO PARTICLES Public/Granted day:2021-10-28
Information query
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