公开(公告)号：US10914006B2

公开(公告)日：2021-02-09

申请号：US15978615

申请日：2018-05-14

Applicant: Huazhong University of Science and Technology

Inventor： Rong Chen ,  Weiming Ba ,  Kai Qu ,  Yun Li ,  Kun Cao ,  Wei Dan

IPC: C23C16/455 ,  C23C16/44

Abstract: A nanoparticle continuous-coating device based on spatial atomic layer deposition. A first-stage pipeline unit, a second-stage pipeline unit, a third-stage pipeline unit and a fourth-stage pipeline unit which are connected sequentially. The first-stage pipeline unit is used for providing a first precursor and enabling the first precursor to be adsorbed on surfaces of nanoparticles. The third-stage pipeline unit is used for providing a second precursor and enabling the second precursor to react with the first precursor on the surfaces of the nanoparticles, so that a monomolecular thin film layer is generated on the surfaces of the nanoparticles. The second-stage and fourth-stage pipeline units are used for cleaning the nanoparticles and discharging the redundant first precursor, the redundant second precursor or reaction by-products.

公开(公告)号：US11236421B2

公开(公告)日：2022-02-01

申请号：US16615060

申请日：2019-04-15

Applicant: Huazhong University of Science and Technology

Inventor： Rong Chen ,  Jiawei Li ,  Bin Shan ,  Xiao Liu ,  Kai Qu ,  Jing Zhang

IPC: C23C16/40 ,  C23C16/44 ,  C23C16/455 ,  C23C16/52

Abstract: An atomic layer deposition device for massively coating micro-nano particles, includes a reaction chamber and a particle container, in which an inlet port is provided at a lower end of the reaction chamber, and an inlet pipe for introducing a precursor or a carrier gas is provided in the inlet port; a chamber door is provided at an upper end of the reaction chamber, so that the particle container can be freely placed in or removed out of the reaction chamber; an air inlet hole is provided at a lower end of the particle container, and the inlet pipe enters the particle container through the air inlet hole.