Invention Grant
- Patent Title: Manufacturing method for exhaust gas purification device
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Application No.: US16497320Application Date: 2018-02-23
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Publication No.: US11236657B2Publication Date: 2022-02-01
- Inventor: Yuki Tanaka , Shoko Fukuyo , Kazuma Nakada , Eiichi Yasutomi , Ryo Nishimura
- Applicant: CATALER CORPORATION
- Applicant Address: JP Kakegawa
- Assignee: CATALER CORPORATION
- Current Assignee: CATALER CORPORATION
- Current Assignee Address: JP Kakegawa
- Agency: Oliff PLC
- Priority: JPJP2017-072988 20170331
- International Application: PCT/JP2018/006814 WO 20180223
- International Announcement: WO2018/180090 WO 20181004
- Main IPC: B05D1/02
- IPC: B05D1/02 ; B05D3/02 ; B01J37/02 ; F01N3/28 ; B01D53/94 ; B01J35/04 ; F01N3/022 ; F01N3/035

Abstract:
The purpose of the present invention is to provide a manufacturing method for an exhaust gas purification device that can uniformly coat a honeycomb substrate with slurry even when using a low viscosity slurry. The present invention pertains to a manufacturing method for an exhaust gas purification device that includes providing a slurry for catalyst layer formation from a shower nozzle onto a honeycomb substrate, coating the honeycomb substrate with the slurry, and firing the honeycomb substrate coated with the slurry, wherein the viscosity of the slurry at a shear rate of 4 s−1 is 800 mPA·s or less, the shower nozzle has a plurality of discharge openings for discharging the slurry, the relationship of the spacing a) of the discharge openings and the diameter b) of the liquid drops formed when starting supply of the slurry is 0.85
Public/Granted literature
- US20210115828A1 MANUFACTURING METHOD FOR EXHAUST GAS PURIFICATION DEVICE Public/Granted day:2021-04-22
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