- Patent Title: Electron microscope, and method for observing measurement sample
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Application No.: US16970862Application Date: 2019-02-18
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Publication No.: US11237121B2Publication Date: 2022-02-01
- Inventor: Shik Shin , Toshiyuki Taniuchi
- Applicant: The University of Tokyo
- Applicant Address: JP Tokyo
- Assignee: The University of Tokyo
- Current Assignee: The University of Tokyo
- Current Assignee Address: JP Tokyo
- Agency: Fox Rothschild LLP
- Agent Robert J. Sacco; Carol E. Thorstad-Forsyth
- Priority: JPJP2018-031379 20180223
- International Application: PCT/JP2019/005874 WO 20190218
- International Announcement: WO2019/163715 WO 20190829
- Main IPC: G01N23/227
- IPC: G01N23/227 ; H01J37/05 ; H01J37/10 ; H01J37/22 ; H01J37/244 ; H01J37/26

Abstract:
An electron microscope includes: a laser light source configured to generate a CW laser; an irradiation lens system configured to irradiate a measurement sample with the CW laser; an energy analyzer configured to disperse, depending on energy, photoelectrons emitted from the measurement sample by irradiation with the CW laser; an energy slit configured to allow a photoelectron with a specified energy to pass, among the photoelectrons; an electron beam detector configured to detect the photoelectron passed through the energy slit; a first electron lens system configured to focus the photoelectrons emitted from the measurement sample onto the energy analyzer; and a second electron lens system configured to project the photoelectron passed through the energy slit onto the electron beam detector.
Public/Granted literature
- US20210140901A1 ELECTRON MICROSCOPE, AND METHOD FOR OBSERVING MEASUREMENT SAMPLE Public/Granted day:2021-05-13
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